From 28f089f7ee4e0705be371194a78d610fc90ed57a Mon Sep 17 00:00:00 2001 From: "Demis D. John" Date: Sun, 10 May 2020 12:16:19 -0700 Subject: [PATCH] added 4x reduction --- README.md | 10 +++++++++- 1 file changed, 9 insertions(+), 1 deletion(-) diff --git a/README.md b/README.md index 43a4d10..3b99575 100644 --- a/README.md +++ b/README.md @@ -122,7 +122,15 @@ Verify your wafer layouts or reticle layouts using the Plot commands: ## Defaults -Default values for most options are specified in the file `ASML_JobCreator/Defaults.py`. For the UCSB Nanofab PAS 5500/300, this includes settings such as 100mm wafer with flat, 6-inch reticle size, default alignment methods and edge exclusion zones etc. Some of these have `set`/`get` methods for manipulating them. +Default values for most options are specified in the file `ASML_JobCreator/Defaults.py`. For the UCSB Nanofab PAS 5500/300, this includes settings such as: + +- 100mm wafer with flat +- 6-inch reticle size +- 4x lens reduction (reticle magnification) +- default alignment methods +- default edge exclusion zones etc. + +Some of these have `set`/`get` methods for manipulating them, others must be edited in this file. # Author(s)